Method for fabricating a recessed channel field effect transistor (FET) device

ABSTRACT

A method for forming a field effect transistor device employs a self-aligned etching of a semiconductor substrate to form a recessed channel region in conjunction with a pair of raised source/drain regions. The method also provides for forming and thermally annealing the pair of source/drain regions prior to forming a pair of lightly doped extension regions within the field effect transistor device. In accord with the foregoing features, the field effect transistor device is fabricated with enhanced performance.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates generally to methods for fabricating fieldeffect transistor devices. More particularly, the present inventionrelates to methods for fabricating field effect transistor devices withenhanced performance.

2. Description of the Related Art

Common in the semiconductor product art is the fabrication and use offield effect transistor devices. Field effect transistor devices arereadily fabricated and scaled with either or both polarities. They aretypically employed as switching devices within both logic semiconductorproducts and memory semiconductor products.

Field effect transistor devices are thus common and generally essentialin the semiconductor product art. However, they are nonetheless notentirely without problems.

In that regard, as semiconductor product integration levels haveincreased and field effect transistor device dimensions have decreased,it has become increasingly difficult to fabricate field effecttransistor devices with enhanced performance. Performance withinadvanced field effect transistor devices of reduced dimensions may becompromised by effects such as short channel effects and source-drainresistance effects.

It is thus desirable to fabricate field effect transistor devices withenhanced performance. It is towards the foregoing object that thepresent invention is directed.

Various field effect transistor devices having desirable properties, andmethods for fabrication thereof, have been disclosed within thesemiconductor product art.

Included but not limiting among the field effect transistor devices andmethods are those disclosed within: (1) Huang, in U.S. Pat. No.5,814,544 (a field effect transistor device with a recessed channelregion formed employing a thermal oxidation method); and (2) Yu, in U.S.Pat. No. 6,225,173 (a field effect transistor device with a recessedchannel formed employing a planarizing method).

The teachings of each of the foregoing references are incorporatedherein fully by reference.

Additional methods for forming field effect transistor devices withenhanced performance are desirable.

It is towards the foregoing object that the present invention isdirected.

SUMMARY OF THE INVENTION

A first object of the invention is to provide a method for forming afield effect transistor device.

A second object of the invention is to provide a method in accord withthe first object of the invention, wherein the field effect transistordevice is formed with enhanced performance.

In accord with the objects of the invention, the invention provides amethod for forming a recessed channel field effect transistor device.

The method first provides a semiconductor substrate. A first sacrificiallayer is formed upon the semiconductor substrate and a pair ofsource/drain regions is implanted into the semiconductor substrate whileemploying the first sacrificial layer as a mask. A pair of secondsacrificial layers is formed overlying the pair of source/drain regionsand adjoining the first sacrificial layer. The first sacrificial layeris then removed to form an aperture which exposes the semiconductorsubstrate. The semiconductor substrate exposed within the aperture isetched to form an elongated aperture. A pair of sacrificial sidewallspacer layers is formed upon the sidewalls of the elongated aperture anda gate dielectric layer is formed at the bottom of the elongatedaperture. A gate electrode is then formed filling the remainder of theelongated aperture. The pair of second sacrificial layers and the pairof sacrificial sidewall spacer layers is then removed. Finally, a pairof lightly doped extension regions is then implanted into thesemiconductor substrate while employing the gate electrode as a mask.

The invention provides a method for forming a field effect transistordevice with enhanced performance.

The invention realizes the foregoing object by forming the field effecttransistor device with a recessed channel region and with lightly dopedextension regions formed after source/drain regions.

BRIEF DESCRIPTION OF THE DRAWINGS

The objects, features and advantages of the invention are understoodwithin the context of the Description of the Preferred Embodiment, asset forth below. The Description of the Preferred Embodiment isunderstood within the context of the accompanying drawings, which form amaterial part of this disclosure, wherein:

FIG. 1, FIG. 2, FIG. 3, FIG. 4, FIG. 5, FIG. 6, FIG. 7, FIG. 8, FIG. 9,FIG. 10 and FIG. 11 show a series of schematic cross-sectional diagramsillustrating the results of progressive stages in forming a field effecttransistor device in accord with a preferred embodiment of theinvention.

DESCRIPTION OF THE PREFERRED EMBODIMENT

The present invention provides a method for forming a field effecttransistor device with enhanced performance.

The invention realizes the foregoing object by forming the field effecttransistor device with a recessed channel region and with lightly dopedextension regions formed after source/drain regions.

The preferred embodiment of the invention illustrates the inventionwithin the context of forming a field effect transistor device within asilicon-on-insulator semiconductor substrate. However, the presentinvention is not intended to be so limited. Rather, the invention may beemployed for forming field effect transistor devices withinsemiconductor substrates including but not limited to siliconsemiconductor substrates and silicon-germanium alloy semiconductorsubstrates, whether bulk semiconductor substrates or silicon (orsilicon-germanium) on-insulator semiconductor substrates. In addition,the present invention may be employed for forming field effecttransistor devices of either or both polarities within a semiconductorsubstrate.

FIG. 1 to FIG. 11 show a series of schematic cross-sectional diagramsillustrating the results of progressive stages in forming a field effecttransistor device in accord with a preferred embodiment of theinvention.

FIG. 1 illustrates a silicon-on-insulator semiconductor substrate priorto forming thereupon the field effect transistor device.

Within FIG. 1, the silicon-on-insulator semiconductor substratecomprises a semiconductor substrate 10 having formed thereupon a buriedoxide layer 12. In turn, formed upon the buried oxide layer 12 is a pairof isolation regions 16 a and 16 b which bound an active silicon layer14 which is also formed upon the buried oxide layer 12.

As noted above, the invention is not limited to a silicon-on-insulatorsemiconductor substrate as illustrated in FIG. 1. Alternatively, theinvention may employ a bulk silicon or silicon-germanium alloysubstrate, a silicon-germanium on-insulator substrate or an otherwiselaminated semiconductor substrate which provides a surface layer formedof a semiconductor material upon which may be formed a field effecttransistor in accord with the invention.

Within FIG. 1, the buried oxide layer 12 is typically a silicon oxidelayer formed to a thickness of from about 1500 to about 4000 angstroms.In addition, the active silicon layer 14 is formed to a thickness offrom about 1 to about 2 microns and a linewidth of from about 0.3 toabout 1 micron. Finally, the pair of isolation regions 16 a and 16 b istypically formed of a silicon oxide material.

FIG. 2 illustrates the results of further processing of thesilicon-on-insulator semiconductor substrate of FIG. 1.

FIG. 2 illustrates a pad dielectric layer 18 formed nominally centeredupon the active silicon layer 14 and a dummy gate 20 formed aligned uponthe pad dielectric layer 18. Together, the pad dielectric layer 18 andthe dummy gate 20 form a first sacrificial layer.

Within the invention, the pad dielectric layer 18 is optional, butgenerally formed of a silicon oxynitride dielectric material formed to athickness of from about 100 to about 300 angstroms. In addition, thedummy gate 20 is typically formed of a silicon oxide material, althoughother materials, which need not necessarily be dielectric materials, mayalso be employed. Typically, the dummy gate 20 is formed to a thicknessof from about 4000 to about 6000 angstroms. Each of the pad dielectriclayer 18 and the dummy gate 20 is formed to a linewidth of from about0.1 to about 0.3 microns.

FIG. 3 illustrates the results of further processing of thesilicon-on-insulator semiconductor substrate of FIG. 2.

FIG. 3 illustrates the results implanting a dose of first implantingdopant ions 23 into the active silicon layer 14 while employing the paddielectric layer 18 and the dummy gate 20 as a mask. The ionimplantation forms a pair of source/drain regions 22 a and 22 b whichinclude a thickness of the active silicon layer 14.

Within the invention, the dose of first implanting dopant ions 23 may beof either polarity as is appropriate for forming the pair ofsource/drain regions 22 a and 22 b, and of a dosage and energy as isotherwise conventional for forming the pair of source/drain regions 22 aand 22 b. Typically, the pair of source/drain regions 22 a and 22 b isformed with a dopant concentration of from about 1E15 to about 1E18dopant atoms per cubic centimeter. In addition, the pair of source/drainregions 22 a and 22 b is typically thermally annealed at a temperatureof from about 900 to about 1100 degrees centigrade for a time period offrom about 1 to about 2 hours such as to repair ion implant damagewithin the active silicon layer 14.

FIG. 4 illustrates the results of further processing of thesilicon-on-insulator semiconductor substrate of FIG. 3.

FIG. 4 illustrates a pair of patterned planarized second sacrificiallayers 24 a and 24 b formed adjoining a pair of opposite sidewalls ofthe dummy gate 20 and the pad dielectric layer 18.

The pair of patterned planarized second sacrificial layers 24 a and 24 bis typically formed of a silicon nitride material when the dummy gate 20is formed of a silicon oxide material and the pad dielectric layer 18 isformed of a silicon oxynitride material. Other materials combinationsmay, however, be employed providing adequate etch selectivity of thedummy gate 20 and the pad dielectric layer 18 with respect to the pairof patterned planarized sacrificial layers 24 a and 24 b. Typically, thepair of patterned planarized second sacrificial layers 24 a and 24 b isformed incident to planarizing a blanket layer while employing aplanarizing method such as a reactive ion etch (RIE) etchbackplanarizing method or (more preferably) a chemical mechanical polish(CMP) planarizing method. Either of the foregoing planarizing methodsmay employ the dummy gate 20 as a planarizing stop layer.

FIG. 5 illustrates the results of further processing of thesilicon-on-insulator semiconductor substrate of FIG. 4.

FIG. 5 illustrates the results of stripping the dummy gate 20 and thepad dielectric layer 18 from interposed between the pair of patternedplanarized second sacrificial layers 24 a and 24 b to form an aperture25 exposing at its bottom a portion of the active silicon layer 14.

The dummy gate 20 and the pad dielectric layer 18 may be strippedselectively with respect to the pair of patterned planarized secondsacrificial layers 24 a and 24 b while employing stripping methods andmaterials as are otherwise generally conventional in the semiconductorproduct fabrication art. Typically, such stripping methods and materialsmay employ, but are not limited to, hydrofluoric acid containingstripping methods and materials when the dummy gate 20 is formed of asilicon oxide material, the optional pad dielectric layer 18 is formedof a silicon oxynitride material and the pair of patterned planarizedsecond sacrificial layers 24 a and 24 b is formed of a silicon nitridematerial.

FIG. 6 illustrates the results of further processing of thesilicon-on-insulator semiconductor substrate of FIG. 5.

FIG. 6 illustrates the results of etching the active silicon layer 14exposed at the bottom of the aperture 25 defined by the pair ofpatterned planarized second sacrificial layers 24 a and 24 b with anetching plasma 26, to form an etched active silicon layer 14′ exposed atthe bottom of an elongated aperture 25′.

The etching plasma 26 will typically employ an etchant gas compositionappropriate to the silicon material from which is formed the activesilicon layer 14. Such an etchant gas composition will typicallycomprise a chlorine containing etchant gas. Typically, the activesilicon layer 14 is etched to a depth of from about 500 to about 2000angstroms when forming the etched active silicon layer 14′. The exposedsurface of the etched active silicon layer 14′ may also be reodxidizedto form a sacrificial oxide layer of from about 10 to about 50 angstromsthereupon, and thus provide enhanced surface conditioning of the etchedactive silicon layer 14′. As is understood by a person skilled in theart, the etch depth when forming the etched active silicon layer 14′ maybe adjusted to provide an optimal thickness of a channel region of afield effect transistor device formed incident to further processing thesilicon-on-insulator semiconductor substrate whose schematiccross-sectional diagram is illustrated in FIG. 6. Such an optimalthickness may be employed to control field effect transistor deviceparameters, such as threshold voltage. In addition, the etch depthprovides a recessed channel region within the field effect transistordevice, in conjunction with a pair of raised source/drain regions 22 aand 22 b within the field effect transistor device.

FIG. 7 shows the results of further processing of thesilicon-on-insulator semiconductor substrate of FIG. 6.

FIG. 7 first shows a pair of sacrificial sidewall spacer layers 28 a and28 b formed into the elongated aperture 25′ and adjoining a pair ofsidewalls of the pair of patterned planarized second sacrificial layers24 a and 24 b. The pair of sacrificial sidewall spacer layers 28 a and28 b may be formed employing a blanket conformal layer deposition andanisotropic etching method as is conventional in the semiconductorproduct fabrication art. Typically, the pair of sacrificial sidewallspacer layers 24 a and 24 b is formed of a silicon oxide material.

FIG. 7 also shows a gate dielectric layer 30 formed upon the etchedactive silicon layer 14′ exposed at the base of the elongated aperture25′. The gate dielectric layer 30 is typically formed of a silicon oxidedielectric material formed incident to thermal oxidation of the etchedactive silicon layer 14′. Typically, the gate dielectric layer 30 isformed to a thickness of from about 10 to about 70 angstroms.

FIG. 8 illustrates the results of further processing of thesilicon-on-insulator semiconductor substrate of FIG. 7.

FIG. 8 illustrates a blanket gate electrode material layer 32 formedupon exposed portions of the pair of patterned planarized secondsacrificial layers 24 a and 24 b, the pair of sacrificial sidewallspacer layers 28 a and 28 b and the gate dielectric layer 30, whilecompletely filling the elongated aperture 25′.

The blanket gate electrode material layer 32 is typically formed of adoped polysilicon material (having a dopant concentration of from about1E19 to about 1E22 dopant atoms per cubic centimeter) formed to anappropriate thickness such as to completely fill the elongated aperture25′.

FIG. 9 illustrates the results of further processing of thesilicon-on-insulator semiconductor substrate of FIG. 8.

FIG. 9 illustrates the results of planarizing the pair of patternedplanarized second sacrificial layers 24 a and 24 b, the pair ofsacrificial sidewall spacer layers 28 a and 28 b and the blanket gateelectrode material layer 32 to form a pair of patterned twice planarizedsecond sacrificial layers 24 a′ and 24 b′, a pair of truncatedsacrificial sidewall spacer layers 28 a′ and 28 b′ and a gate electrode32′.

The foregoing planarizing is typically effected while employing achemical mechanical polish planarizing method.

FIG. 10 illustrates the results of further processing of thesilicon-on-insulator semiconductor substrate of FIG. 9.

In a first instance, FIG. 10 illustrates the results of stripping thepair of patterned twice planarized second sacrificial layers 24 a′ and24 b′ and the pair of truncated sacrificial sidewall spacer layers 28 a′and 28 b′ from adjacent or adjoining the gate electrode 32′.

The pair of twice planarized second sacrificial spacer layers 24 a′ and24 b′ when formed of a silicon nitride material may typically bestripped while employing a phosphoric acid etchant solution at elevatedtemperature. In addition, the pair of truncated sacrificial sidewallspacer layers 28 a′ and 28 b′ when formed of a silicon oxide materialmay be stripped while employing a hydrofluoric acid etchant solution.

Finally, FIG. 10 also illustrates a pair of lightly doped extensionregions 34 a and 34 b formed within the recess within the etched activesilicon layer 14′, and bridging to the pair of source/drain regions 22 aand 22 b. The pair of lightly doped extension regions 34 a and 34 b isformed while employing a dose of second implanting dopant ions 35 inconjunction with the gate electrode 32′ as a mask.

The dose of second implanting dopant ions 35 is of the same polarity asthe dose of first implanting dopant ions 23, but provided at aconsiderably lower dose of and energy such as to provide the pair oflightly doped extensions regions 34 a and 34 b of dopant concentrationfrom about 1E12 to about 1E14 dopant atoms per cubic centimeter.

FIG. 11 illustrates the results of further processing of thesilicon-on-insulator semiconductor substrate of FIG. 10.

FIG. 11 illustrates a pair of laminated spacer layers 36 a and 36 bformed adjoining a pair of sidewalls of the gate electrode 32′.

The pair of laminated spacer layers 36 a and 36 b is typically formed ofa silicon nitride material laminated to a silicon oxide material as alower layer.

FIG. 11 also shows a series of metal silicide layers 38 a, 38 b and 38 cformed upon the pair of source/drain regions 22 a and 22 b and the gateelectrode 32′.

The series of metal silicide layers 38 a, 38 b and 38 c may be formedfrom any of several metals as are conventional in the semiconductorfabrication art, including but not limited to titanium, tungsten,platinum, vanadium and molybdenum metals. Typically, the series of metalsilicide layers 38 a, 38 b and 38 c is each formed to a thickness offrom about 200 to about 1000 angstroms, while employing a salicidemethod.

FIG. 11 illustrates a field effect transistor device formed within asilicon-on-insulator semiconductor substrate. The field effecttransistor device is formed with enhanced performance.

The field effect transistor device realizes the foregoing object byfabricating the field effect transistor device with a recessed channelregion, and with a pair of lightly doped drain extension regions formedafter a pair of source/drain regions.

Within the field effect transistor device of the present invention, therecessed channel region is formed in a self-aligned fashion with respectto the pair of source/drain regions such as to provide reducedsource/drain resistance within the field effect transistor device. Theself-aligned method also provides for forming a gate electrode of lessthan minimal photolithographically resolvable linewidth and for forminga gate electrode after source/drain region formation thus avoiding ionimplant damage to the gate electrode. In addition, the pair of raisedsource/drain regions (and the resultant pair of embedded laminatedspacers as 36 a and 36 b as illustrated in FIG. 11) provide forinhibited metal silicide layer incursion and bridging. Further, byproviding a method wherein the pair of source/drain regions 22 a and 22b is formed and thermally annealed prior to forming the pair of lightlydoped extension regions 34 a and 34 b, short channel effect performanceis generally improved.

The preferred embodiment of the invention is illustrative of theinvention rather than limiting of the invention. Revisions andmodifications may be made to methods, materials, structures anddimensions in accord with the preferred embodiment of the inventionwhile still providing a method for forming a field effect transistordevice in accord with the invention, further in accord with theaccompanying claims.

1. A method for forming a recessed channel field effect transistordevice comprising: providing a semiconductor substrate; forming a firstsacrificial layer upon the semiconductor substrate; forming a pair ofsource/drain regions in the semiconductor substrate while employing thefirst sacrificial layer as a mask; forming a pair of second sacrificiallayers overlying the pair of source/drain regions and adjoining thefirst sacrificial layer; removing the first sacrificial layer to form anaperture which exposes the semiconductor substrate; etching thesemiconductor substrate exposed within the aperture to form an elongatedaperture; forming adjoining a pair of sidewalls of the elongatedaperture a pair of sacrificial sidewall spacer layers, forming at thebottom of the elongated aperture a gate dielectric layer and formingfilling the remainder of the elongated aperture a gate electrode;removing the pair of second sacrificial layers and the pair ofsacrificial sidewall spacer layers; and implanting a pair of lightlydoped extension regions into the semiconductor substrate while employingthe gate electrode as a mask.
 2. The method of claim 1 wherein thesemiconductor substrate is selected from the group consisting of bulksilicon semiconductor substrates and silicon-on-insulator semiconductorsubstrates.
 3. The method of claim 1 wherein the first sacrificial layeris formed of an oxide material.
 4. The method of claim 1 wherein thepair of second sacrificial layers is formed of a silicon nitridematerial.
 5. The method of claim 1 wherein the pair of sacrificialsidewall spacer layers is formed of a silicon oxide material.
 6. Themethod of claim 1 wherein the semiconductor substrate is etched to adepth of from about 500 to about 2000 angstroms.
 7. The method of claim1 wherein the pair of source/drain regions is thermally annealed priorto forming the pair of lightly doped extension regions.
 8. A method forforming a recessed channel field effect transistor device comprising:providing a silicon-on-insulator semiconductor substrate; forming afirst sacrificial layer upon the silicon-on-insulator semiconductorsubstrate; implanting a pair of source/drain regions into an activesilicon layer within the silicon-on-insulator semiconductor substratewhile employing the first sacrificial layer as a mask; forming a pair ofsecond sacrificial layers overlying the pair of source/drain regions andadjoining the first sacrificial layer; removing the first sacrificiallayer to form an aperture which exposes the active silicon layer;etching the active silicon layer exposed within the aperture to form anelongated aperture; forming adjoining a pair of sidewalls of theelongated aperture a pair of sacrificial sidewall spacer layers, formingat the bottom of the elongated aperture a gate dielectric layer andforming filling the remainder of the elongated aperture a gateelectrode; removing the pair of second sacrificial layers and the pairof sacrificial sidewall spacer layers; and implanting a pair of lightlydoped extension regions into the semiconductor substrate while employingthe gate electrode as a mask.
 9. The method of claim 8 wherein the firstsacrificial layer is formed of an oxide material.
 10. The method ofclaim 8 wherein the pair of second sacrificial layers is formed of asilicon nitride material.
 11. The method of claim 8 wherein the pair ofsacrificial sidewall spacer layers is formed of a silicon oxidematerial.
 12. The method of claim 8 wherein the active silicon layer isetched to a depth of from about 500 to about 2000 angstroms.
 13. Themethod of claim 8 wherein the pair of source/drain regions is thermallyannealed prior to forming the pair of lightly doped extension regions.